R.J. Zambrano

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This paper presents the development of high deposition rate protocrystalline Si:H and /spl mu/c-Si:H as obtained by hot wire chemical vapor deposition (HWCVD, or catalytic CVD) and very high frequency plasma enhanced CVD (VHF PECVD) and protocrystalline SiGe:H as obtained by conventional PECVD. Using the latter two low bandgap materials as absorber layer,(More)
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