Qiushi Huang

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Design and synthesis of basic functional circuits are the fundamental tasks of synthetic biologists. Before it is possible to engineer higher-order genetic networks that can perform complex functions, a toolkit of basic devices must be developed. Among those devices, sequential logic circuits are expected to be the foundation of the genetic(More)
Mg-based multilayers, including SiC/Mg, Co/Mg, B(4)C/Mg, and Si/Mg, are investigated for solar imaging and a He II calibration lamp at a 30.4 nm wavelength. These multilayers were fabricated by a magnetron sputtering method and characterized by x-ray reflection. The reflectivities of these multilayers were measured by synchrotron radiation.(More)
A surface structured extreme ultraviolet multilayer mirror was developed showing full band suppression of UV (λ=100-400  nm) and simultaneously a high reflectance of EUV light (λ=13.5  nm). The surface structure consists of Si pyramids, which are substantially transparent for EUV but reflective for UV light. The reflected UV is filtered out by blazed(More)
A broadband [SiC/W/Ir](2) multilayer coating was deposited onto a diffraction grating to enhance the grating efficiency in the 50-100 nm wavelength range in a Seya-Namioka mount. The holographic ion-beam etched grating had a laminar profile with 1200 lines/mm. The coating was designed by using the subquarterwave multilayer theory. The measurement results(More)
Two kinds of Al/Zr (Al(1%wtSi)/Zr and Al(Pure)/Zr) multilayers for extreme ultraviolet (EUV) optics were deposited on fluorine doped tin oxide coated glass by using direct-current magnetron sputtering technology. The comparison of the two systems shows that the Al(1%wtSi)/Zr multilayers have the lowest interfacial roughness and highest reflectivity. Based(More)
High spectral purity at longer wavelength side is demanded in many extreme ultraviolet (EUV) and soft X-ray (together also referred to as XUV) optical systems. It is usually obtained at the expense of a high loss of XUV efficiency. We proposed and developed a new method based on a periodic, tapered structure integrated with an EUV multilayer. The longer(More)
Narrow bandwidth Si/C multilayer mirrors are fabricated and characterized for the Z-pinch plasma diagnostic at a wavelength of 16.5 nm. To reduce the large stress of the multilayer and maintain a practical reflectivity, different working pressures, from 0.13 Pa to 0.52 Pa, are optimized during the deposition. The grazing incidence x-ray reflectometry (GIXR)(More)
Reactive sputtering with a mixture of argon and nitrogen (N<sub>2</sub> partial pressure of 4%, 8%, and 15%) as the working gas is used to develop the high reflectance Pd/B<sub>4</sub>C multilayers for soft X-ray region application. Compared to the pure Ar fabricated sample, the interface roughness of the nitridated multilayer is slightly increased while(More)
An approach to designing wideband blazed multilayer gratings is introduced and applied to gratings operating at 17-25 nm. We demonstrate single-order operation of broadband multilayer gratings, despite their very wide spectral and angular bandpass, when only one diffraction wave is excited and the diffraction efficiency reaches the reflectivity of a(More)
Low stress W/Si multilayer mirrors are demanded in the hard X-ray telescopes to achieve the high angular resolution. To reduce the stress of the as-deposited multilayer and maintain a high reflectivity, two groups of low-temperature annealing experiments were performed on the periodic multilayers with a d-spacing of ~3.8 nm. The temperature-dependent(More)