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We review the basics of the extremely thin SOI (ETSOI) technology and how it addresses the main challenges of the CMOS scaling at the 20-nm technology node and beyond. The possibility of V<sub>T</sub> tuning with backbias, while keeping the channel undoped, opens up new opportunities that are unique to ETSOI. The main device characteristics with regard to(More)
This work is devoted to the systematic study of the optical and magneto-optical properties of sputter deposited CuFe₂O₄ thin films in the photon energy region between 2 and 5 eV using spectroscopic ellipsometry and magneto-optical Kerr spectroscopy. The spectral dependence of both the diagonal and off-diagonal elements of the permittivity tensor is(More)
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