Petra Feichtinger

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This paper describes a methodology to measure process windows in-line at level using voltage contrast inspection and special families of test structures. This methodology allows rapid turn-around of experiments designed to find the most robust and best centered process conditions. Each family of structures should be laid out with a single super-pitch so(More)
This paper describes a novel route to brightfield (BF) wafer inspector recipe setup leading to substantially shortened recipe setup time and improved recipe quality. The traditional BF recipe optimization process involves adjusting several inspection parameters necessitating multiple iterations between the BF inspector and SEM review tool. Not only is(More)
The propagation and interaction of individual misfit dislocations was studied using double crystal x-ray topography. We determined that as a gliding 60° misfit dislocation encounters a strain field in its path, it will cross-slip to a specific lattice direction, which we believe depends on the film thickness at the time of the interaction. We studied these(More)
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