Patrick Quarterman

We don’t have enough information about this author to calculate their statistics. If you think this is an error let us know.
Learn More
K. Wimmer,1 D. Bazin,1 A. Gade,1,2 J. A. Tostevin,1,3 T. Baugher,1,2 Z. Chajecki,1 D. Coupland,1,2 M. A. Famiano,4 T. K. Ghosh,5 G. F. Grinyer,1,* R. Hodges,1,2 M. E. Howard,6 M. Kilburn,1,2 W. G. Lynch,1,2 B. Manning,6 K. Meierbachtol,1,7 P. Quarterman,1,2 A. Ratkiewicz,1,2 A. Sanetullaev,1,2 S. R. Stroberg,1,2 M. B. Tsang,1 D. Weisshaar,1 J.(More)
The embedded mask patterning (EMP) method uses a plasma etching process to form an ultrasmall grain size ($\sim 4$ nm), but thermally stable isolated L10-FePt magnetic grains with an embedded Ru hard mask. EMP demonstrated as a promising and potentially cost-effective solution to fabricate ultrahigh density magnetic media for heat-assisted magnetic(More)
We report final-state-exclusive measurements of the light charged fragments in coincidence with (26)Ne residual nuclei following the direct two-proton removal from a neutron-rich (28)Mg secondary beam. A Dalitz-plot analysis and comparisons with simulations show that a majority of the triple-coincidence events with two protons display phase-space(More)
The embedded mask patterning (EMP) process provides a potential L1<sub>0</sub>-FePt media solution for 1-10 Tbit/in<sup>2</sup> magnetic recording areal density level. Methanol/Ar reactive ion etch process of FePt media (Ru 2 nm/FePt 8 nm) in EMP is investigated using an ion-neutral-redep synergy etch rate model with the consideration of sputtered(More)
  • 1