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Journals and Conferences
Metal-assisted chemical etching (MaCE) of silicon in conjunction with shaped catalysts was used to fabricate 3D nanostructures such as sloping channels, cycloids, and spirals along with traditional vertical channels. The investigation used silver nanorods, nanodonuts along with electron beam lithography (EBL)-patterned gold nanodiscs, nanolines, squares,… (More)
In recent years metal-assisted chemical etching (MaCE) of silicon, in which etching is confined to a small region surrounding metal catalyst templates, has emerged as a promising low cost alternative to commonly used three-dimensional (3D) fabrication techniques. We report a new methodology for controllable folding of 2D metal catalyst films into 3D… (More)
A low-temperature flexible process, named "chemical transfer", was developed to assemble well-aligned carbon nanotube (ACNT) structures onto various substrates. The technology was featured by (1) in situ functionalization of ACNTs with reactive functional groups during the CVD process and (2) covalently bonded interface with a self-assembled monolayer (SAM)… (More)
The ability to fabricate 3D spiraling structures using metal-assisted chemical etching (MaCE) is one of the unique advantages of MaCE over traditional etching methods. However, control over the chirality of the spiraling structures has not been established. In this work, a systematic parametric study was undertaken for MaCE of star-shaped catalysts,… (More)
Metal-assisted Chemical Etching of silicon has recently emerged as a powerful technique to fabricate 1D, 2D, and 3D nanostructures in silicon with high feature fidelity. This work demonstrates that out-of-plane rotational catalysts utilizing polymer pinning structures can be designed with excellent control over rotation angle. A plastic deformation model… (More)
A process that allows control over the 3D motion of catalyst nanostructures during metal-assisted chemical etching by their local pinning prior to etching is demonstrated. The pinning material acts as a fulcrum for rotation of the catalyst structures resulting in etching of silicon features with rotational geometry.
There are a number of emerging technologies such as metamaterials, photonic wave-guides, nano-imprint lithography (NIL), field emission devices and through silicon via (TSV), that require high resolution and high aspect ratio nanofabrication techniques for good performance. Unfortunately, current nanofabrication techniques, including photolithography and… (More)
A solvothermal method was used to synthesize functionalized graphene, which exhibits an ultrahigh capacitance. This solvothermal method allows a fine control of the density of functionalities on graphene surface. The structure of resulting functionalized graphene is characterized by X-ray photoelectron spectroscopy (XPS), thermal gravimetric analysis (TGA),… (More)
This paper addresses the state of art nano science and technology regarding next generation high density microelectronics and photonics packaging applications, including carbon nanotubes (CNTs) for electrical/thermal devices, nano lead-free alloy, molecular wires for electrical interconnects, etc.
In this work, we introduce a maskless, resist-free rapid prototyping method to fabricate three-dimensional structures using electron beam induced deposition (EBID) of amorphous carbon (aC) from a residual hydrocarbon precursor in combination with metal-assisted chemical etching (MaCE) of silicon. We demonstrate that EBID-made patterned aC coating, with… (More)