Ola Nilsen

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Atomic layer deposition (ALD) has successfully provided thin films of organic-inorganic hybrid materials based on saturated linear carboxylic acids and trimethylaluminium (TMA). Films were grown for seven carboxylic acids: oxalic, malonic, succinic, glutaric, pimelic, suberic and sebacic acid, i.e. ranging from 2 to 10 carbon atoms in the molecular(More)
Thin films of stable metal-organic frameworks (MOFs) such as UiO-66 have enormous application potential, for instance in microelectronics. However, all-gas-phase deposition techniques are currently not available for such MOFs. We here report on thin-film deposition of the thermally and chemically stable UiO-66 in an all-gas-phase process by the aid of(More)
Thin films of organic-inorganic hybrid materials have been grown by the atomic layer deposition (ALD) technique, using trimethylaluminium (TMA) and aromatic carboxylic acids such as 1,2-benzene dicarboxylic acid, 1,3-benzene dicarboxylic acid, 1,4-benzene dicarboxylic acid, 1,3,5-benzene tricarboxylic acid, 1,2,4,5-benzene tetracarboxylic acid as(More)
Thin films of iron cobalt oxides with spinel-type structure are made by the atomic layer deposition (ALD) technique using Fe(thd)3 (Hthd = 2,2,6,6-tetramethylheptane-3,5-dione), Co(thd)2, and ozone as precursors. Pulse parameters for ALD-type growth are established and such growth can be achieved at deposition temperatures between 185 and 310 degrees C.(More)
Ln2O3 thin films with optically active f-electrons (Ln = Pr, Nd, Sm, Eu, Tb, Dy, Ho, Er, Tm, Yb) have been grown on Si(100) and soda lime glass substrates by atomic layer deposition (ALD) using Ln(thd)3 (Hthd = 2,2,6,6-tetramethyl-3,5-heptanedione) and ozone as precursors. The temperature range for depositions was 200-400 °C. Growth rates were measured by(More)
This study investigates the effect of fluoride surface modification on the surface properties of polycrystalline ceramic TiO(2) and the biological response of murine osteoblast cells to fluoride-modified TiO(2) in vitro. Fluoride concentrations up to 9 at.% were detected and the fluoride was found to bind to the surface in a ligand exchange reaction between(More)
This study aimed at the investigation of the effect of zirconium dioxide (ZrO2) addition on the mechanical properties of titanium dioxide (TiO2) bone scaffolds. The highly biocompatible TiO2 has been identified as a promising material for bone scaffolds, whereas the more bioinert ZrO2 is known for its excellent mechanical properties. Ultra-porous TiO2(More)
A main goal in the construction of thin films is to control film growth in all aspects. Accurate control of the building blocks and their reaction sites is one way to achieve that. This is a key feature of the atomic layer deposition (ALD) technique. The aim of this study is to achieve such growth control of organic-inorganic thin films. The organic(More)
Thin films of sodium and potassium oxides have for the first time been deposited using atomic layer deposition. Sodium and potassium complexes of tert-butanol, trimethylsilanol and hexamethyldisilazide have been evaluated as precursors by characterising their thermal properties as well as tested in applications for thin film depositions. Out of these,(More)
This thesis describes the deposition of binary lead oxide and ternary lead titanate, lead zirconate, bismuth silicate, and bismuth titanate films by atomic layer deposition (ALD) and characterization of structural, compositional and surface properties of the films. The first part of the thesis reviews the principles of the ALD technique and the relevant(More)