Naokazu Murata

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Effect of the change of crystallinity and micro texture of electroplated copper thin films by annealing on the stressinduced migration was investigated experimentally and theoretically. The micro texture of electroplated copper thin films changed drastically as a function of their electroplating conditions and the annealing temperature after the(More)
Effect of the micro texture of electroplated copper thin film interconnections on stress-induced migration was investigated experimentally and theoretically. The micro texture of electroplated copper thin films changed drastically as a function of the annealing temperature after the electroplating. However, stress-induced migration was activated even though(More)
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