Nahm Werner

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The measurement and QCD analysis of neutral and charged current cross sections at HERA are presented. For the kinematic range of four-momentum transfer Q between ≈ 1 GeV 2 and 30000 GeV 2 and Bjorken x between 0.0013 and 0.65 the data are compared to NLO QCD predictions. In dedicated NLO QCD analyses the extraction of the parton distribution functions of(More)
  • Ralf H Ubel, Nahm Werner, Korreferent, Rainald Flume
  • 2007
In the rst part of this thesis we prove a generalization of the Verlinde formula to fermionic rational conformal eld theories. Using`simple current' arguments one nds that the fusion coeecients of the fermionic theory are equal to sums of fusion coeecients of the bosonic projection. We argue that one is forced to weaken the axioms of fusion algebras for(More)
Male and female Wistar rats were exposed to waste gas arising from a plasma etching process in the semiconductor industries for six hr per day, five days per week, for four weeks in order to characterize subacute organ toxicity and genotoxicity. The waste gas was a complex mixture of different chlorinated hydrocarbons, inorganic by-products, and unused(More)
In dry etching processes--one of the sources of potential exposure to toxic wastes in the semiconductor industry--complex mixtures of inorganic and organic compounds arise from reactions between feed stock gases (BCl3/Cl2), top layers (aluminium photoresist), and the carrier gas (N2). Two different fractions of the complex mixture--one an ethanolic solution(More)
The measurement and QCD analysis of neutral and charged current cross sections at HERA are presented. For the kinematic range of four-momentum transfer Q between ≈ 1 GeV 2 and 30000 GeV 2 and Bjorken x between 0.0013 and 0.65 the data are compared to NLO QCD predictions. In dedicated NLO QCD analyses the extraction of the parton distribution functions of(More)
Dry etching processes in semiconductor manufacturing use ionized gases in closed reactors at pressures below 1 torr. Vacuum pump systems that service the reaction chambers are potential sources of exposure to complex mixtures of inorganic and organic compounds. These mixtures consist of unused process gases and process by-products that condense and(More)
The development of semiconductor production has been accompanied by an increased use of toxic production materials and an increased release of potential toxic wastes, which are harmful to health and environment. This paper gives an overview of occupational health hazards resulting from production materials in the microelectronics industry and from waste(More)
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