N M Ceglio

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Techniques are described for at-wavelength interferometry of multilayer coated optics designed for use in extreme-ultraviolet lithography. Broadly tunable undulator radiation, which covers the spectral region from 45 to 400 A, is described. The coherent power available at these wavelengths is described, and several types of interferometer that might be(More)
  • N M Ceglio
  • 1989
In the past half decade or so there has been a technological revolution in our ability to generate, control, manipulate, focus, and detect x rays. The emergence of x-ray lasers and synchrotron insertion devices has increased the brightness of laboratory x-ray sources 8 to 12 orders of magnitude over what was available in the late 1960s. In addition, the(More)
We report an explicit demonstration of classical guided-wave propagation at XUV and soft-x-ray wavelengths. Experiments were performed using narrow-band synchrotron radiation at 5, 20.8, 21, and 30 nm. Free-standing gold transmission gratings served as waveguide structures. These structures had a 300-nm grating period with waveguide channel widths as small(More)
We present a protocol for the design of an illumination system (front end) for a soft-x-ray projection lithography tool. The protocol is illustrated by specific front-end designs. The most complete design analysis is for a laser-driven system. Other drivers; undulator, synchrotron orbital radiation, and plasma discharge, are also discussed.
A molybdenum silicon multilayer is irradiated with 13.4-nm radiation to investigate changes in multilayer performance under simulated soft-x-ray projection lithography (SXPL) conditions. The wiggler-undulator at the Berlin electron storage ring BESSY is used as a quasi-monochromatic source of calculable spectral radiant intensity and is configured to(More)
Design considerations and fabrication procedures for Fresnel zone plates appropriate for high-resolution coded imaging of x-ray and particle emission from laser produced plasmas are presented. Fabrication results for free standing zone plate structures of high Z material (gold), large zone number (100</=n</=240), microscopic minimum linewidth(More)
Soft x-ray projection lithography (SXPL) is an attractive technique for the fabrication of high-speed, high-density integrated circuits. In an SXPL stepper, the x-ray imaging mirrors consist of multilayer coatings deposited onto high precision substrates. The stepper is intended to fabricate ultra-high spatial-resolution structures with a minimum feature(More)
A gold transmission grating has been coupled to a high-resolution Wolter-design grazing-incidence reflection x-ray microscope to produce an imaging x-ray spectrometer of unprecedented spatial resolution, spectral range, and collection solid angle. In a series of test experiments conducted at 1.75-2 keV, the instrument demonstrated a spectral resolving(More)
The choice of the operational wavelength for a soft-x-ray projection lithography system affects a wide variety of system parameters such as optical design, sources, resists, and multilayer mirrors. Several system constraints limit the choice for the operational wavelength. In particular, optical imaging requirements place an upper limit and throughput(More)