Ming-Peng Li

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We report progress in using nanoimprint lithography to fabricate high fidelity blazed diffraction gratings. Anisotropically etched silicon gratings with 200 nm period and 7.5° blaze angle were successfully replicated onto 100 mm diameter wafers with subnanometer roughness and excellent profile conformity. Out-of-plane distortion induced by residual stress(More)
A facile and environmentally friendly method was introduced to incorporate montmorillonite (MMT) as an inorganic phase into quaternized hemicelluloses (QH) for forming hemicellulose-based films. Two fillers, polyvinyl alcohol (PVA) and chitin nanowhiskers (NCH), were added into the hemicelluloses/MMT hybrid matrices to prepare hybrid films, respectively.(More)
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