Michael E Grisham

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We have demonstrated a new type of high repetition rate 46.9 nm capillary discharge laser that fits on top of a small desk and that it does not require a Marx generator for its excitation. The relatively low voltage required for its operation allows a reduction of nearly one order of magnitude in the size of the pulsed power unit relative to previous(More)
Images with a spatial resolution of 120-150 nm were obtained with 46.9 nm light from a compact capillary-discharge laser by use of the combination of a Sc-Si multilayer-coated Schwarzschild condenser and a free-standing imaging zone plate. The results are relevant to the development of compact extreme-ultraviolet laser-based imaging tools for nanoscience(More)
We report the demonstration of reflection mode imaging of 100 nm-scale features using 46.9 nm light from a compact capillary-discharge laser. Our imaging system employs a Sc/Si multilayer coated Schwarzschild condenser and a freestanding zone plate objective. The reported results advance the development of practical and readily available surface and(More)
We demonstrate that phase-matched frequency upconversion of ultrafast laser light can be extended to shorter wavelengths by using longer driving laser wavelengths. Experimentally, we show that the phase-matching cutoff for harmonic generation in argon increases from 45 to 100 eV when the driving laser wavelength is increased from 0.8 to 1.3 microm. Phase(More)
We demonstrate a significant extension of the high-order harmonic cutoff by using a fully-ionized capillary discharge plasma as the generation medium. The preionized plasma dramatically reduces ionization-induced defocusing and energy loss of the driving laser due to ionization. This allows for significantly higher photon energies, up to 150 eV, to be(More)
—We report the imprinting of nanometer-scale gratings by interferometric lithography at = 46 9 nm using an Ne-like Ar capillary discharge laser. Gratings with periods as small as 55 nm were imprinted on poly-methyl methacrylate using a Lloyd's mirror interferometer. This first demonstration of nanopatterning using an extreme ultraviolet (EUV) laser(More)
Three dimensional images were obtained using a single high numerical aperture hologram recorded in a high resolution photoresist with a table top λ = 46.9 nm laser. Gabor holograms were numerically reconstructed over a range of image planes by sweeping the propagation distance in the numerical reconstruction algorithm, allowing numerical optical sectioning.(More)
We review recent experimental and theoretical work on the use of counterpropagating light to enhance high-order harmonic generation through all-optical quasi-phase matching. Also presented is a new technique for measuring the coherence of high harmonics in the nonlinear medium. This information is crucial for understanding the process of harmonic generation(More)
Gas phase monosaccharides (2-deoxyribose, ribose, arabinose, xylose, lyxose, glucose galactose, fructose, and tagatose), generated by laser desorption of solid sample pellets, are ionized with extreme ultraviolet photons (EUV, 46.9 nm, 26.44 eV). The resulting fragment ions are analyzed using a time of flight mass spectrometer. All aldoses yield identical(More)
The damage threshold and damage mechanism of extreme-ultraviolet Sc/Si multilayer mirror coatings are investigated with focused nanosecond pulses at 46.9-nm radiation from a compact capillary-discharge laser. Damage threshold fluences of approximately 0.08 J/cm2 are measured for coatings deposited on both borosilicate glass and Si substrates. The use of(More)