Michael Austin

Learn More
We report advances in nanoimprint lithography, its application in nanogap metal contacts, and related fabrication yield. We have demonstrated 5 nm linewidth and 14 nm linepitch in resist using nanoimprint lithography at room temperature with a pressure less than 15 psi. We fabricated gold contacts (for the application of single macromolecule devices) with 5(More)
An array of nano-channels was fabricated from silicon based semiconductor materials to stretch long, native dsDNA. Here we present a labeling scheme in which it is possible to identify the location of specific sequences along the stretched DNA molecules. The scheme proceeds by first using the strand displacement activity of the Vent (exo-) polymerase to(More)
A key issue in nanoimprint lithography (NIL) is determining the ultimate pitch resolution achievable for various pattern shapes and their critical dimensional control. To this end, we demonstrated the fabrication of 6 nm half-pitch gratings and 0.04 µm 2 cell area SRAM metal interconnects with 20 nm line half-pitch in resist by NIL. The mould for the 6 nm(More)
We report on the fabrication of short-channel polymer organic thin-film transistors ͑OTFTs͒ using nanoimprint lithography. Currently, there is significant interest in OTFTs due to their potential application in inexpensive, large-area electronics. However, polymer carrier mobilities are typically poor, and thus to increase the OTFT drive current per unit(More)
We present a simple process to fabricate gold nanocontacts with a gap as small as sub-10 nm. This method uses a two-step process of nanoimprint lithography ͑NIL͒ and electromigration. First, 20 nm wide gold nanowires were fabricated by NIL on a silicon dioxide substrate. Then by passing an electric current through a nanowire, the nanowire is split into two(More)
We report a simple parallel process for the fabrication of nanoscale electrical contacts to probe the conductance characteristics of a molecular self-assembled monolayer (SAM) using nanoimprint lithography (NIL), a patterning technology capable of sub-10 nm resolution. We fabricated multiple samples, each with 40 gold contacts to a commonly investigated(More)
A high bandwidth critical path accumulator (1 sample/4GHz) capable of providing accurate timing margin information is reported. We present an adaptive voltage mechanism using these critical path accumulators that improves upon existing approaches by: (1) enabling replica paths to function as a statistical sample of the full set of Fmax limiting paths(More)