Highly Influential Citations9
Claim Your Author Page
Ensure your research is discoverable on Semantic Scholar. Claiming your author page allows you to personalize the information displayed and manage publications (all current information on this profile has been aggregated automatically from publisher and metadata sources).
Recently, a new type of wastewater treatment system became the focus of scientific research, the mesh filter activated sludge system. It is a modification of the membrane bioreactor where a membrane… Continue Reading
The Noell Conversion Process was developed to guarantee the safe disposal of sewage sludge and other waste materials by means of thermal treatment, evenwith very strict emission standards. The center… Continue Reading
The main objectives of the JET ITER-like Wall Project are to provide a beryllium main wall and tungsten divertor with at least a 4 year lifetime to allow full evaluation of the materials and related… Continue Reading
Experiments were carried out to manufacture aspheric surfaces to extreme ultraviolet (EUV) standards, within the European Project extreme UV concept lithography development system (EUCLIDES). Results… Continue Reading
Epitaxial GaN films have been grown on GaN single-crystal substrates, using on surface cracked ammonia as nitrogen precursor for molecular beam epitaxy. With this approach excellent optical and… Continue Reading
The realistic notion of great power competition over shrinking oil reserves seems to fit in the patterns of China s oil diplomacy. Indeed, many pundits and politicians in Washington and elsewhere are… Continue Reading
Abstract Six Joint European Torus (JET) divertor tiles were coated with tungsten marker stripes for erosion/deposition studies. The average thickness was 3.4 μm and the film was uniform within 5%… Continue Reading
In this paper, the metrology and fabrication concepts at Carl Zeiss will be reviewed. The present status in the fabrication of specific EUVL mirrors will be reported as well.
Strained single- and triple-quantum-well (SQW and TQW), large optical cavity GaInAsSb/AlGaAsSb/GaSb laser diodes emitting at 2.26 μm are investigated. Internal loss coefficients as low as 5 and 7.7… Continue Reading
EUVL, i.e. microlithography at 13nm is one of the most likely technologies to satisfy the requirements for the 45nm-node and below of the IC-manufacturing roadmap. The development of the first step… Continue Reading