Masatoshi Yamato

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Optical projection technique has been driving the lithographic scaling with unceasing evolution of wave length (λ) and numerical aperture (NA) historically. Although the delay of EUV (Extreme Ultra Violet) tool for HVM (High Volume Manufacturing) is concerned, down-scaling proceeds unceasingly with the extension approach of 193 immersion. One of most(More)
Scaling in the manufacture of semiconductor devices has come to be supported by advances in photolithography technology. Looking to the future, we can expect even more advances in photolithography, but at present, multi-patterning using 193nm immersion lithography is finding widespread use as an alternative technology that can contribute greatly to even(More)
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