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  • Tseng-Chin Luo, Mango Chia-Tso Chao, +7 authors Cheng Mao Lee
  • Computer Science
  • IEEE Transactions on Very Large Scale Integration…
  • 2014 (First Publication: 1 May 2014)
  • As process technologies continually advance, process variation has greatly increased and has gradually become one of the most critical factors for IC manufacturing. Furthermore, these increasinglyContinue Reading
  • Masaharu Goto, Yasuhiro Miyake, Jun Taniguchi, Kenichi Takano
  • Materials Science
  • IEEE Transactions on Semiconductor Manufacturing
  • 2013 (First Publication: 1 August 2013)
  • A fast and accurate capacitance measurement technique, direct charge measurement (DCM), is introduced to improve productivity of semiconductor parametric testing. The approach is simpler and muchContinue Reading
  • Yasuhiro Miyake, Masaharu Goto, Shunsuke Fujii, Hidetoshi Nishimura
  • Engineering
  • International Conference on Microelectronic Test…
  • 2010 (First Publication: 1 March 2010)
  • This paper reports capacitance measurement correlation between Direct Charge Measurement (DCM) and conventional LCR meter on 0.18um CMOS test structure. Measurement results of interconnect and MOSCAPContinue Reading
  • Kenichi Takano, Masaharu Goto, Ernesto Shiling, Arthur Gasasira, Jiun-hsin Liao
  • Engineering
  • International Conference on Microelectronic Test…
  • 2016 (First Publication: 28 March 2016)
  • Direct Charge Measurement (DCM) has a capability to improve the capacitance measurement time in parametric test. Through an actual wafer measurement, we have successfully verified that DCM canContinue Reading