Martina Lattemann

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A study of the ability to control the deposition flux in a high power impulse magnetron sputtering discharge using an external magnetic field is presented in this article. Pulses with peak power of 1.4 kWcm were applied to a conventional planar magnetron equipped with an Al target. The high power creates a high degree of ionization of the sputtered(More)
In this study, the effect on thin film growth due to an anomalous electron transport, found in high power impulse magnetron sputtering (HiPIMS) has been investigated for the case of a planar circular magnetron. An important consequence of this type of transport is that it affects the way ions are being transported in the plasma. It was found that a(More)
Nanometer-sized diamond grains are commonly found in primitive chondritic meteorites, but their origin is puzzling. Using evidence from atomistic simulation, we establish a mechanism by which nanodiamonds form abundantly in space in a two-stage process involving condensation of vapor to form carbon onions followed by transformation to nanodiamond in an(More)
Ta thin films were grown on Si substrates at different inclination angles with respect to the sputter source using high power impulse magnetron sputtering (HIPIMS), an ionized physical vapor deposition technique. The ionization allowed for better control of the energy and directionality of the sputtered species, and consequently for improved properties of(More)
In order to improve the adhesion of hard coatings such as CrN, a surface pretreatment by the novel high power impulse magnetron sputtering (HIPIMS) technique followed by reactive unbalanced d.c. magnetron sputtering deposition was performed using a Cr target. The HIPIMS plasma comprising a high metal ion-to-neutral ratio consisting of singleand(More)
We demonstrate the deposition of fully dense, stoichiometric TiN films on amorphous SiO2 by reactive high power impulse magnetron sputtering (HiPIMS) in the absence of both substrate heating and applied bias. Contrary to the highly underdense layers obtained by reactive dc magnetron sputtering (dcMS) under similar conditions, the film nanostructure AC C EP(More)
Current and voltage have been measured in a pulsed high power impulse magnetron sputtering (HiPIMS) system for discharge pulses longer than 100 μs. Two different current regimes could clearly be distinguished during the pulses: (1) A high-current transient followed by (2) a plateau at lower current. These results provide a link between the HiPIMS and the(More)
A monochromator∕Fizeau interferometer∕intensified CCD camera system is described that was developed for the measurement of the shape of spectral lines that are rapidly time varying. The most important operating parameter that determines the performance of the instrument is the size of the entrance aperture as this determines both the light throughput and(More)
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