Martin Seamons

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The self-aligned double patterning (SADP) module is a scheme to form 32 nm or 22 nm line structures that extend the useful range of either dry scanner or immersion scanner photolithography tools. Once reliable baseline processes for SADP flow have been developed, defect data collection, understanding, characterization, and reduction become increasingly(More)
This brief focuses on the physical characteristics of three dielectric films which can induce a significant degree of tensile or compressive stress in the channel of a sub-90-nm node MOS structure. Manufacturable and highly reliable oxide films have demonstrated, based on simulation, the ability to induce greater than 1.5-GPa tensile stress in the Si(More)
The effective use of wind-tunnel testing in determining aerodynamic properties of a body is very much dependent upon the reliability and speed with which wind-tunnel data can be reduced. The ability to provide reduced aerodynamic coefficients in real time, or on-line, greatly increases the operating efficiency of the wind tunnels and thereby reduces(More)
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