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Multiparameter and multiscale real-time environmental monitoring of a river and estuary system will be realized through the River and Estuary Observatory Network (REON) for the Hudson River in New York. In this paper, we describe a system under development that provides a holistic view of this complex and dynamic natural environment for scientific research,(More)
Arcing between the plasma and the wafer, kit, or target in PVD processes can cause significant wafer damage and foreign material contamination which limits wafer yield. Monitoring the plasma and quickly detecting this arcing phenomena is critical to ensuring that today's PVD processes run optimally and maximize product yield. This is particularly true in(More)
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