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Atomic layer deposition of molybdenum oxide using bis(tert-butylimido)bis(dimethylamido) molybdenum
Molybdenum trioxide films have been deposited using thermal atomic layer deposition techniques with bis(tert-butylimido)bis(dimethylamido)molybdenum. Films were deposited at temperatures from 100 toExpand
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Low Temperature Growth of High Purity, Low Resistivity Copper Films by Atomic Layer Deposition
The atomic layer deposition of copper metal thin films was achieved using a three precursor sequence entailing Cu(OCHMeCH2NMe2)2, formic acid, and hydrazine. A constant growth rate of 0.47−0.50Expand
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Volatility, high thermal stability, and low melting points in heavier alkaline earth metal complexes containing tris(pyrazolyl)borate ligands.
Treatment of MI(2) (M = Ca, Sr) or BaI(2)(THF)(3) with 2 equiv of potassium tris(3,5-diethylpyrazolyl)borate (KTp(Et2)) or potassium tris(3,5-di-n-propylpyrazolyl)borate (KTp(nPr2)) in hexane atExpand
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Substrate Selectivity of (tBu-Allyl)Co(CO)3 during Thermal Atomic Layer Deposition of Cobalt
Tertbutylallylcobalttricarbonyl (tBu-AllylCo(CO)3) is shown to have strong substrate selectivity during atomic layer deposition of metallic cobalt. The interaction of tBu-AllylCo(CO)3 with SiO2Expand
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Volatility and High Thermal Stability in Mid- to Late-First-Row Transition-Metal Diazadienyl Complexes
Treatment of MCl2 (M = Cr, Mn, Fe, Co, Ni) with 2 equiv of lithium metal and 1,4-di-tert-butyl-1,3-diazadiene (tBu2DAD) in tetrahydrofuran at ambient temperature afforded Cr(tBu2DAD)2 (38%),Expand
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Atomic layer deposition of CaB2O4 films using bis(tris(pyrazolyl)borate)calcium as a highly thermally stable boron and calcium source
The atomic layer deposition of CaB2O4 was carried out using bis(tris(pyrazolyl)borate)calcium (CaTp2) and water as precursors. CaTp2 melts at 280 °C, undergoes solid state thermal decomposition atExpand
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Precursor design and reaction mechanisms for the atomic layer deposition of metal films
Abstract Deposition of thin films with desired compositions, conformality and bonding to substrates is a key component in nanotechnology research. The growth of metal films by atomic layer depositionExpand
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Synthesis, structural characterization, and properties of heavier alkaline earth complexes containing bis(pyrazolyl)borate or bis(3,5-diisopropylpyrazolyl)borate ligands
Abstract Treatment of a solid mixture of KBH4 with six equivalents of 3,5-diisopropylpyrazole (iPr2pzH) at 180 °C afforded KTpiPr2(iPr2PzH)3 in 53% yield. KBpiPr2 was synthesized in 56% yield byExpand
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Atomic Layer Deposition Growth of BaB2O4 Thin Films from an Exceptionally Thermally Stable Tris(pyrazolyl)borate-Based Precursor
The atomic layer deposition growth of BaB2O4 thin films was investigated using Ba(TpEt2)2 and water as precursors between 240 and 400 °C. The process provided uniform films and exhibited a large ALDExpand
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Efficient hydride and pyrazolyl redistribution upon thermolysis of a calcium complex containing dihydrobis(pyrazolyl)borate ligands.
Thermolysis of CaBp(2)(THF)(2) (THF = tetrahydrofuran) at 190-200 °C and 0.05 Torr leads to a redistribution reaction to afford CaTp(2) (90%) and CaTp(BH(4)) (84%). Treatment of CaTp(BH(4)) with THFExpand
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