Marie Angelopoulos

Learn More
that Me-LPPP, in addition to MEH-PPV, is hole-limited with a Ca cathode. For conjugated polymer films, such as PAni, the improvement in quantum efficiency is due to an increase in the anode work function to 5.1 ± 0.1 eV, which results in a nearly ohmic contact. For nanoparticle mono-layers, the improvement is due to an increase in the local electric field(More)
Conjugated polymers in the nondoped and doped conducting state have an array of potential applications in the microelectronics industry. Conducting polymers are effective discharge layers as well as conducting resists in electron beam lithography, find applications in metallization (electrolytic and electroless) of plated through-holes for printed circuit(More)
The continuing drive by the semiconductor industry to fabricate smaller structures using photolithography will soon require dimensional control at length scales comparable to the size of the polymeric molecules in the materials used to pattern them. The current technology, chemically amplified photoresists, uses a complex reaction-diffusion process to(More)
Near-edge X-ray absorption fine structure spectroscopy (NEXAFS) is utilized to provide insight into surface chemical effects in model photoresist films. First, NEXAFS was used to examine the resist/air interface including surface segregation of a photoacid generator (PAG) and the extent of surface deprotection in the film. The concentration of PAG at the(More)
±1 is characteristic of the C±N stretching mode in the QBB moiety, [11] where Q and B denote the quinoid and benzenoid rings, respectively. The 1310 cm ±1 peak, apart from showing a red shift to 1300 cm ±1 , gains substantial intensity. Along with this, a new feature appears at 1240 cm ±1 , which is assigned to C±N + stretching in the BBB moiety. We notice(More)
Moisture absorption in model photoresist films of poly(4-hydroxystryene) (PHOSt) and poly(tert-butoxycarboxystyrene) (PBOCSt) supported on silicon wafers was measured by X-ray and neutron reflectivity. The overall thickness change in the films upon moisture exposure was found to be dependent upon the initial film thickness. As the film becomes thinner, the(More)
  • 1