• Publications
  • Influence
The incorporation of preformed metal nanoparticles in zinc oxide thin films using aerosol assisted chemical vapour deposition
Abstract The feasibility of Aerosol Assisted Chemical Vapour Deposition (AA-CVD) has been investigated for the growth of zinc oxide (ZnO) films containing preformed metal nanoparticles. TheExpand
Pulsed transfer etching of PS-PDMS block copolymers self-assembled in 193 nm lithography stacks.
This work presents the graphoepitaxy of high-χ block copolymers (BCP) in standard industry-like lithography stacks and their transfer into the silicon substrate The process includes conventional 193Expand
Soft Graphoepitaxy for Large Area Directed Self-Assembly of Polystyrene-block-Poly(dimethylsiloxane) Block Copolymer on Nanopatterned POSS Substrates Fabricated by Nanoimprint Lithography
Polyhedral oligomeric silsequioxane (POSS) derivatives have been successfully employed as substrates for graphoepitaxial directed self-assembly (DSA) of block copolymers (BCPs). Tailored POSSExpand
Evidence of Organic Luminescent Centers in Sol-Gel-Synthesized Yttrium Aluminum Borate Matrix Leading to Bright Visible Emission.
Yttrium aluminum borate powders prepared by sol-gel process show that propionic acid initially used to solubilize the yttrium nitrate is decomposed into aromatic molecules confined within the inorganic matrix, corroborated by slow afterglow decay and thermoluminescence experiments. Expand
Afterglow Luminescence in Wet-Chemically Synthesized Inorganic Materials: Ultra-Long Room Temperature Phosphorescence Instead of Persistent Luminescence.
An important step forward in understanding the complex luminescence mechanism in such promising wet-chemically synthesized functional materials with rigid glassy inorganic matrix is more efficient in preserving phosphorescence at elevated temperatures, opening the path for several attractive applications including time-resolved bioimaging and thermometry. Expand
Directed self-assembly of PS-b-PDMS into 193nm photoresist patterns and transfer into silicon by plasma etching
Block CoPolymer (BCP) self-assembly creates periodical patterns with feature sizes eventually below 10 nm. On plain substrates, ordering is only obtained in grains not larger than a few micrometersExpand
Electromigration-induced failure in operando characterization of 3D interconnects: microstructure influence
A hitherto unseen SEM in operando observation method is devised and a clear relation is established between voids evolution and the one of the electrical resistance. Expand
Fabrication and characterization of three-dimensional silver/air inverted opal photonic crystals
Photonic crystals made from noble metals such as silver are an interesting class of material for many applications such as chemical sensing, solar cells or photonics. Their fabrication suffers from aExpand
Scalable chemical synthesis of doped silicon nanowires for energy applications.
When used in symmetric supercapacitor devices, 1% P-doped SiNWs exhibit an areal capacity of 0.25 mF cm-2 and retention of 80% of the initial capacitance after one million cycles, demonstrating excellent cycling stability of the SiNW electrodes in the presence of organic electrolytes. Expand
Nucleation and Chemical Transformation of RuO2 Films Grown on (100) Si Substrates by Atomic Layer Deposition
We describe the formation of RuO2 thin films grown using atomic layer deposition (ALD) on (100) Si substrates from Ru(EtCp)2 and O2, and the subsequent influence of annealing temperature andExpand