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- Publications
- Influence
An Application Of Interference Microscopy To Integrated Circuit Inspection And Metrology
- M. Davidson, K. Kaufman, Isaac Mazor, Felix Cohen
- Materials Science, Engineering
- Advanced Lithography
- 17 April 1987
The results of recent research on synthetic electro-optic imaging using a Linnik interference microscope are presented. A new technique is used in which images are produced by calculating the degree… Expand
Inverse scattering approach to SEM linewidth measurements
- M. Davidson, A. Vládar
- Physics, Engineering
- Advanced Lithography
- 14 June 1999
The inverse scattering approach presented here enables the calculation of estimates of top and bottom line width values, sidewall angle, corner rounding, the heights from top-down SEM images or line… Expand
Model-based CD–SEM metrology at low and ultralow landing energies: implementation and results for advanced IC manufacturing
- D. Gorelikov, J. Remillard, N. Sullivan, M. Davidson
- Chemistry
- 1 November 2005
Critical Shape Metrology (CSM), a Critical Dimension Scanning Electron Microscope (CD-SEM)-based technique that extracts accurate feature shape information from images obtained during routine in-line… Expand
Image sharpness measurement in scanning electron microscopy—part I
- A. Vládar, M. Postek, M. Davidson
- Computer Science
- 6 December 2006
TLDR
Analytic waveguide solutions and the coherence probe microscope
- M. Davidson
- Materials Science
- 1 March 1991
Comparison between rigorous light-scattering methods
- M. Davidson, B. Kleemann, Joerg Bischoff
- Mathematics, Engineering
- Advanced Lithography
- 7 July 1997
In this paper four radically different methods for solving scattering of light off of mainly lameller grating type structures are compared. The methods are: (1) the analytic waveguide method… Expand
A modal model for diffraction gratings
- M. Davidson
- Physics
- 11 September 2002
Abstract A description of an algorithm for a rather general modal grating calculation is presented. Arbitrary profiles, depth, and permittivity are allowed. Gratings built up from sub-gratings are… Expand
New low-voltage SEM technology for imaging and metrology of submicrometer contact holes and other high-aspect-ratio structures
- K. Monahan, Guillermo L. Toro-Lira, M. Davidson
- Physics, Engineering
- Advanced Lithography
- 4 August 1993
In this work we present the results of a radically different approach to imaging of high-aspect ratio structures such as contact holes. Our approach utilizes two backscattered electron detection… Expand
High-resolution optical metrology
- R. Silver, R. Attota, +6 authors R. Larrabee
- Engineering
- SPIE Advanced Lithography
- 10 May 2005
Recent advances in optical imaging techniques have unveiled new possibilities for optical metrology and optical-based process control measurements of features in the 65 nm node and beyond. In this… Expand
New method to enhance overlay tool performance
- R. Attota, R. Silver, +4 authors R. D. Larrabee
- Computer Science, Engineering
- SPIE Advanced Lithography
- 27 May 2003
TLDR
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