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In this paper, we present a flexible parylene-C shadow mask technology for creating microscale patterns on flat and curved surfaces. The smallest feature size of 4 µm is demonstrated and the technology is scalable up to full wafer size. With the addition of SU-8 pillars, we also demonstrate multi mask processing with an alignment accuracy of about 5-6 µm.(More)
A reusable high aspect ratio parylene-C shadow mask technology for diverse micropat-terning applications, Sens. Abstract In this paper, we present a low cost, flexible and reusable parylene-C shadow mask technology for diverse micropatterning applications. The smallest feature size of 4 ␮m is demonstrated and the technology is scalable up to full wafer(More)
We demonstrate experimentally negative refraction by a photonic crystal prism and imaging of a point source by a photonic crystal slab at 1.5 microm wavelength. The photonic crystal structures were nanofabricated in a InGaAsP/InP heterostructure platform, and optical characterization was performed using a near-field scanning optical microscope. By designing(More)
In this paper, we present the fabrication of nano optical elements by means of deep reactive ion etching technique (Bosch process) on a silicon-on-insulator substrate. The nano structures are fabricated in a two step process. The first step consists of direct-writing nanoscale patterns on PMMA polymer by electron beam lithography. These nano patterns are(More)
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