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The authors present a self-imaging lithographic technique, capable of patterning large area periodic structures of arbitrary content with nanoscale resolution. They start from the original concept of… (More)
L. Urbanski,1 M. C. Marconi,1,* L. M. Meng,2 M. Berrill,3 O. Guilbaud,4 A. Klisnick,2 and J. J. Rocca1 1NSF ERC for Extreme Ultraviolet Science and Technology, Colorado State University, Fort… (More)
We report the uninterrupted operation of an 18.9 nm wavelength tabletop soft x-ray laser at 100 Hz repetition rate for extended periods of time. An average power of about 0.1 mW was obtained by… (More)
Related Articles Comparison of the effects of downstream H2and O2-based plasmas on the removal of photoresist, silicon, and silicon nitride J. Vac. Sci. Technol. B 31, 021206 (2013) Impacts of point… (More)
Related Articles Thermally reflowed ZEP 520A for gate length reduction and profile rounding in T-gate fabrication J. Vac. Sci. Technol. B 30, 051603 (2012) Formation of large-area GaN nanostructures… (More)
We describe a coherent nanolithography approach using the Talbot effect in combination with a table top EUV laser emitting at 46.9 nm. The method was used to print large areas of periodic features… (More)
Table-top extreme ultraviolet lasers at λ=46.9 allow compact photo-lithography systems utilizing coherent imaging techniques. Interferometric lithography, holographic lithography and Talbot… (More)
We present results with different nanopatterning techniques using table top extreme ultraviolet lasers. The three approaches are interferometric lithography, Talbot self imaging and holographic… (More)
We present a defect-free scalable nano-patterning scheme based on the Talbot effect with extreme ultraviolet laser illumination.
We report on defect tolerant, extreme ultraviolet (EUV) lithography technique. We envision that our technique will impact both the quality and the cost of nano-fabrication with coherent EUV light.