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In this paper, we present BoxRouter 2.0, a hybrid and robust global router with discussion on its architecture and implementation. As high performance VLSI design becomes more interconnect-dominant, efficient congestion elimination in global routing is in greater demand. Hence, we propose BoxRouter 2.0 which has strong ability to improve routability and(More)
In decentralized consensus optimization, a connected network of agents collaboratively minimize the sum of their local objective functions over a common decision variable, where their information exchange is restricted between the neighbors. To this end, one can first obtain a problem reformulation and then apply the alternating direction method of(More)
In this article, we present BoxRouter 2.0, and discuss its architecture and implementation. As high-performance VLSI design becomes more interconnect-dominant, efficient congestion elimination in global routing is in greater demand. Hence, we propose a global router which has a strong ability to improve routability and minimize the number of vias with(More)
Electron beam lithography (EBL) is a promising maskless solution for the technology beyond 14nm logic node. To overcome its throughput limitation, recently the traditional EBL system is extended into MCC system. In this paper, we present E-BLOW, a tool to solve the overlapping aware stencil planning (OSP) problems in MCC system. E-BLOW is integrated with(More)
By employing the Lyapunov-Krasovskii functional and linear matrix inequality (LMI) approach, the problem of global asymptotical stability is studied for recurrent neural networks with both discrete time-varying delays and distributed time-varying delays. Some sufficient conditions are given for checking the global asymptotical stability of recurrent neural(More)
As minimum feature size and pitch spacing further decrease, triple patterning lithography (TPL) is a possible 193nm extension along the paradigm of double patterning lithography (DPL). However, there is very little study on TPL layout decomposition. In this paper, we show that TPL layout decomposition is a more difficult problem than that for DPL. We then(More)
Electronic Beam Lithography (EBL) is an emerging maskless nanolithography technology which directly writes the desired circuit pattern into wafer using e-beam, thus it overcomes the diffraction limit of light in current optical lithography system. However, low throughput is its key technical hurdle. In conventional EBL system, each rectangle in the layout(More)
Consider the consensus problem of minimizing f (x) = n i=1 fi(x) where each fi is only known to one individual agent i belonging to a connected network of n agents. All the agents shall collaboratively solve this problem and obtain the solution via data exchanges only between neighboring agents. Such algorithms avoid the need of a fusion center, offer(More)
In this paper, we present ELIAD, an efficient lithography aware detailed router to optimize silicon image after optical proximity correction (OPC) in a correct-by-construction manner. We first propose a compact post-OPC litho-metric for a detailed router based on statistical characterization. We characterize the interferences among weak grids filled with(More)
In Double Patterning Lithography (DPL), conflict and stitch minimization are two main challenges. Post-routing mask decomposition algorithms [1–4] may not be enough to achieve high quality solution for DPL-unfriendly designs, due to complex metal patterns. In this paper, we propose an efficient framework of WISDOM to perform wire spreading and mask(More)