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Nowadays people's life become more rich and convenient than before, but the obesity also become a problem with people. One cause of obesity is lack of exercise. Although the reason is known by people and the method of keeping health is self maintenance, but it is hard for most people, especially the elderly people. Because of this, we design a daily(More)
Cluster C implantation at low temperature has been studied in terms of amorphous Si (a-Si) formation and elimination of B implanted induced end of range defects (EORDs). Thickness of a-Si can be controlled by C equivalent energy and dose. Monomer C never creates a-Si layer at less than 1E15/ cm<sup>2</sup> at 25&#x00B0;C implant. Dose increase and(More)
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