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This paper studies on the application of X-ray irradiation from synchrotron light for burnishing head patterning. Feasibility study of SU-8 negative photoresist for AlTiC hard mask in reactive ion etching in CF4 plasma is investigated and compared with chromium and AZ photoresist. X-ray lithography is used to make SU-8 hard mask on AlTiC substrate, while(More)
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