Koji Takayanagi

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We developed a Wide IO DRAM controller chip with Through Silicon Via (TSV) technology. Test circuitry is embedded in the micro-IOs placed between the fine pitch TSVs which can reject TSV connectivity failures prior to stacking process. In order to reduce Vmin degradation induced by 512 DQs simultaneously switching noise, we introduce a package-board(More)
A Wide IO DRAM controller chip with Through Silicon Via (TSV) technology is implemented. Test circuitry for prebonding TSV tests are embedded in between the fine pitch TSVs. In order to reduce Vmin degradation induced by 512 DQs simultaneously switching noise, we introduce a package-board impedance optimization method utilizing a full digital noise monitor.(More)
Design techniques for 3-D SoC stacked with a Wide I/O DRAM with through silicon via (TSV) technology were developed. Some of the developed techniques were applied to design a Wide I/O DRAM controller chip. Micro-I/O cells and area efficient decoupling capacitor cells are implemented in between the fine pitch TSV array. Test circuitry for pre-bonding TSV(More)
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