Koichiro Kishima

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A novel approach to three-dimensionally (3-D) integrate nanophotonic and electronic devices in silicon is described. The method is based on the SIMOX (Separation by Implantation of OXygen) process, to realize three-dimensionally (3-D) integrated devices in a monolithic fashion. In this approach, photonic and electronic devices are realized on vertically(More)
We demonstrated near-field recording with the combination of a GaN laser diode and a 1.5 NA objective lens. The realized linear bit density was less than 90 nm (corresponding to the areal recording density over 40 Gbit/in/sup 2/) regardless of using a small 1.0 mm-diameter super-hemispherical solid immersion lens (SIL). Further improvement of a near-field(More)
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