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P-type hydrogenated microcrystalline silicon (muc-Si:H) thin films (~100 nm) were deposited using plasma enhanced chemical vapor deposition (PECVD) at a substrate temperature of 150degC. RF power… (More)
This paper describes two important joint industry projects (JIP) relating to flexible pipe technology which are presently ongoing. The first JIP involves the development of new industry wide… (More)