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Mix-and-match overlay method by compensating dynamic scan distortion error
This paper discusses the compensation method and APC system to reduce errors in mix and matching overlay between scanners. We proposed the compensation model for intra-field errors in mix andExpand
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Flexible alignment mark design applications using a next generation phase grating alignment system
In this paper, alignment and overlay results on processed short-flow wafers are presented. The impact of various mark designs on overlay performance was investigated, using a newly developed phaseExpand
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Method of robust pattern design for lens aberration
Recently, the critical dimension (CD) abnormality due to lens aberrations of exposure tool has become one of the critical issues in production of semiconductor devices. The most remarkable feature ofExpand
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