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- Publications
- Influence
Mix-and-match overlay method by compensating dynamic scan distortion error
- T. Kono, Manabu Takakuwa, Keita Asanuma, Nobuhiro Komine, T. Higashiki
- Engineering
- SPIE Advanced Lithography
- 29 April 2004
This paper discusses the compensation method and APC system to reduce errors in mix and matching overlay between scanners. We proposed the compensation model for intra-field errors in mix and… Expand
Flexible alignment mark design applications using a next generation phase grating alignment system
- P. Hinnen, Hyun-Woo Lee, +4 authors T. Higashiki
- Engineering
- SPIE Advanced Lithography
- 10 May 2005
In this paper, alignment and overlay results on processed short-flow wafers are presented. The impact of various mark designs on overlay performance was investigated, using a newly developed phase… Expand
Method of robust pattern design for lens aberration
- Nobuhiro Komine, Kenji Konomi, Keita Asanuma, K. Tawarayama, T. Higashiki
- Mathematics, Engineering
- SPIE Advanced Lithography
- 28 May 2004
Recently, the critical dimension (CD) abnormality due to lens aberrations of exposure tool has become one of the critical issues in production of semiconductor devices. The most remarkable feature of… Expand