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This paper reports labeler agreement in the transcription of Korean prosody using Korean ToBI (K-ToBI) [9]. Twenty utterances representing five different types of speech were produced by 18 speakers and transcribed by 21 labelers differing in their levels of experience with K-ToBI. Following the stringent metric used for English ToBI evaluation [14,12],(More)
1. Motivation Lithography for below 0.25 um generation strongly demands OPC(Optica1 Proximity Correction) technics to achieve the better pattem fidelity that normally improves overlay margin, CD tolerance, Device characteristics such as leakage current margin and etc. The first step to design mask layout having OPC should be simulation. Normally, the main(More)
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