Kee-Bong Choi

  • Citations Per Year
Learn More
When the short displacement of a piezoelectric element in a compliant stage with simple flexures is amplified for large motion range by an amplification mechanism, a large displacement causes an excessive stress in a simple flexure. Moreover the excessive stress has the possibility of a yielding failure. A cartwheel flexure hinge offers the compliant stage(More)
This paper presents the design and analysis of a miniaturized nano-motion stage which is driven by piezo stacks. The piezo-driven stage manufactured by the conventional machining is limited to decrease its size due to the size of conventional piezo stack and the characteristics of the machining. In this paper, the proposed stage consists of three layers to(More)
A simple process which utilizes a 2D stamp based on UV-NIL is proposed. The main idea is to control the cured region on the micrometer scale by using a developable resist. For the conventional UV-NIL process, a collimated UV light is transmitted through the transparent stamp to cure the overall resist as shown in Fig. S1a. However, if the size of the UV(More)
This paper presents the fabrication of a thin and flexible polydimethylsiloxane (PDMS) stamp with a thickness of a few tens of um and its application to nanoimprint lithography (NIL). The PDMS material generally has a low elastic modulus and high adhesive characteristics. Therefore, after being treated, the thin PDMS stamp is easily deformed and torn,(More)
This paper presents a piezo-driven compliant stage for nano positioning with two degree-of-freedom parallel linear motions. Nano positioning is one of the most important factors in completion of nanotechnologies. It can be accomplished by flexure-based compliant stages driven by piezo-actuators. For compact configuration, the compliant stage is stacked by(More)
This paper describes a tentative result on the way of developing nano-order precision robot to handle micro objects with under 10 nm resolution of positioning. For mechanism, we established the nano order precision robot manipulator stage with the workspace range to be 100 mum times 100 mum times 100 mum, and we proposed a conceptual design of 6 dof(More)
We present a process based on nanoimprint lithography for the fabrication of a microchannel mold having nanopatterns formed at the bottoms of its microchannels. A focused laser beam selectively cures the resist in the micrometer scale during nanoimprint lithography. Nanopatterns within the microchannels may be used to control microfluidic behavior.
This paper describes a tentative results obtained on the way of developing the nano order precision robot that works with the resolution of 10nm or less. For precision positioning of robot manipulator, we adopt the flexure hinge mechanism composed with notches and holes that allows high stiffness and easy applications to construct the parallel manipulator.(More)
This paper describes one approach to build a nano order precision robot manipulator stage. We propose conceptual design of 6 dof manipulator structure, 3 dof in plane motion and 3 dof out plane motion. Especially, in plane motion, we proposed a 3-PPR planar parallel manipulator, which consists of three active prismatic joints, three passive prismatic(More)
  • 1