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Abstract The recently developed High Aspect Ratio Si Etch (HARSE) process is widely used for applications requiring silicon structures with high aspect ratios. This process relies on the alternation… (More)
In this paper, free standing beams and trench structures are successfully fabricated in p-type silicon using electrochemical etching in HF-dimethyl-formamide (DMF). The morphology of the etched… (More)
Free surface fluctuations of molten steel in the mold of a continuous caster are considered to have a significant effect on the surface quality of the cast. To find out the relationship between the… (More)
Abstract For devices of bonded silicon and glass structures fabricated by deep reactive ion etching (DRIE), it is important to avoid damage at the silicon sidewall and backside during through-wafer… (More)
Abstract Due to the microloading effect, an overetch in through-wafer etchings by deep reactive ion etching (DRIE) has to be considered in the fabrication of glass–silicon structures, which results… (More)
- Tsukasa Matsuura, Tatsuya Fukami, +6 authors Koichi Hamanaka
- 2000
Abstract We report on a new concept 2×2 fiber-optical switching device with an electromagnetically operated cantilever. The device is composed of a switching mirror module and a fiber array module.… (More)
- Martial Chabloz, Jianxia Jiao, Yukihisa Yoshida, Tsukasa Matsuura, Kazuhiko Tsutsumi
- Proceedings IEEE Thirteenth Annual International…
- 2000
Due to the microloading effect, an overetch in through wafer etchings by DRIE has to be taken into account in the fabrication of glass-silicon structures, which results in damages of the silicon… (More)
This paper reports a new macroporous-based micromachining technique. Macroporous silicon is formed by electrochemical etching in hydrofluoric acid. This etching technique produces straight pores with… (More)
Abstract This paper reports on a technique of macroporous-based micromachining for full wafers. A 3.6 kW xenon lamp of whose intensity can be varied is employed to generate electronic holes during… (More)
- Yuichi Sakai, Akira Yamashita, Tsukasa Matsuura, Kazuhiko Tsutsumi
- Photonics West - Micro and Nano Fabricated…
- 1998
This paper describes the new diaphragm structure using SiNx/SOG for a micro flow sensor. Its purpose is the measurement of a correct flow rate of various gases or liquids. The proposed sensor… (More)