Karen K Gleason

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Chemical vapor deposition (CVD) polymerization utilizes the delivery of vapor-phase monomers to form chemically well-defined polymeric films directly on the surface of a substrate. CVD polymers are desirable as conformal surface modification layers exhibiting strong retention of organic functional groups, and, in some cases, are responsive to external(More)
A solvent-free initiated chemical vapor deposition (iCVD) process was used to create low surface energy poly(1H,1H,2H,2H-perfluorodecyl acrylate) (PPFDA) thin films at deposition rates as high as 375 nm/min. Fourier transform infrared spectroscopy (FTIR) and X-ray photoelectron spectroscopy showed full retention of the fluorine moieties, and no measurable(More)
Chemical vapor deposition (CVD) is a widely-used technology for the preparation of conformal and defect-free inorganic thin films with systematically tunable properties. Polymers are a desirable class of materials for surface modification because of their low cost, wide array of chemical and physical functionality and mechanical flexibility. Initiated and(More)
We demonstrate series-integrated multijunction organic photovoltaics fabricated monolithically by vapor-deposition in a transposed subcell order with the near-infrared-absorbing subcell in front of the green-absorbing subcell. This transposed subcell order is enabled by the highly complementary absorption spectra of a near-infrared-absorbing(More)
A procedure is developed and validated for making a non-functionalized polyolefin fabric/film highly bactericidal and fungicidal which involves a free-radical grafting of maleic anhydride, followed by an attachment of polyethylenimine (PEI) and its subsequent N-alkylation. Separately, cotton fabric coated with a micron layer of a hydrophobic polymer using(More)
A nonplasma technique, hot-filament chemical vapor deposition ~HFCVD!, is an alternative method for producing organosilicon films of novel structure. Films are deposited onto room-temperature substrates from the precursors hexamethylcyclotrisiloxane (D3) and octamethylcyclotetrasiloxane (D4) at high rates ~.1 mm/min!. Filament temperature can be used to(More)
Given its biocompatibility, elasticity, and gas permeability, poly(dimethylsiloxane) (PDMS) is widely used to fabricate microgrooves and microfluidic devices for three-dimensional (3D) cell culture studies. However, conformal coating of complex PDMS devices prepared by standard microfabrication techniques with desired chemical functionality is challenging.(More)
Well-adhered, conformal, thin (<100 nm) coatings can easily be obtained by chemical vapor deposition (CVD) for a variety of technological applications. Room temperature modification with functional polymers can be achieved on virtually any substrate: organic, inorganic, rigid, flexible, planar, three-dimensional, dense, or porous. In CVD polymerization, the(More)
As the complexity of microphotonic devices grows, the ability to precisely trim microring resonators becomes increasingly important. Photo-oxidation trimming uses UV irradiation to oxidize a cladding layer composed of polymerized hexamethyldisilane (6M2S) deposited with plasma-enhanced chemical vapor deposition (PECVD). PECVD 6M2S has optical properties(More)
Initiated chemical vapor deposition (iCVD) is able to synthesize linear and cross-linked poly(2-hydroxyethyl methacrylate) (PHEMA) thin films, in one step, from vapors of 2-hydroxyethyl methacrylate (HEMA), ethylene glycol diacrylate (EGDA), and tert-butyl peroxide (TBPO) without using any solvents. This all-dry technique also allows control of the(More)