Learn More
We present an amorphous Si anode deposited on a Cu nanopillar current collector, fabricated using a thermal roll-to-roll process followed by electroformation and LPCVD, for application in high-rate Li-ion batteries. Cu nanopillar current collectors with diameters of 250 and 500 nm were patterned periodically with 1 μm pitch and 2 μm height to optimize the(More)
Carbon based spin-on organic hardmask (C-SOH) was used as an imprint resin to fabricate sub 50 nm sized patterns. Imprinting of C-SOH was done with a polyurethaneacrylate (PUA) stamp. Patternability and etch resistance of the C-SOH resin was compared to poly(methyl methacrylate) (PMMA). C-SOH can be patterned at the nanosize using imprint lithography and(More)
Ag-nanomesh-based highly bendable conducting electrodes are developed using a combination of metal nanotransfer printing and embossing for the 6-inch wafer scale. Two Ag nanomeshes, including pitch sizes of 7.5 and 10 μm, are used to obtain highly transparent (approximately 85% transmittance at a wavelength of 550 nm) and electrically conducting properties(More)
Silica nanostructures were fabricated on glass substrate using a microwave assisted direct patterning (MADP) process, which is a variety of soft lithography. During the MADP process using polydimethylsiloxane (PDMS), mold and microwave heating are performed simultaneously. Blanket thin film and micro- to nano-sized structures, including moth-eye patterns of(More)
UV curing nanoimprint lithography is one of the most promising techniques for the fabrication of micro- to nano-sized patterns on various substrates with high throughput and a low production cost. The UV nanoimprint process requires a transparent template with micro- to nano-sized surface protrusions, having a low surface energy and good flexibility.(More)
We report an organic light emitting diode (OLED) with a hydrogen silsesquioxane as a scattering material, for enhancing light extraction efficiency. A tetragonal photonic crystal was used as pattern type, and fabricated using a direct printing technique. Planarization was accomplished using TiO₂ solgel solution, having a refractive index identical to that(More)
  • 1