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Modern placement process involves global placement, legalization, and detailed placement. Global placement produce a placement solution with minimized target objective, which is usually wire-length, routability, timing, etc. Legalization removes cell overlap and aligns the cells to the placement sites. Detailed placement further improves the solution by(More)
Due to a significant mismatch between the objectives of wirelength and routing congestion, the routability issue is becoming more and more important in VLSI design. In this paper, we present a high quality placer Ripple 2.0 to solve the routability-driven placement problem. We will study how to make use of the routing path information in cell spreading and(More)
Triple Patterning Lithography (TPL) is widely recognized as a promising solution for 14/10nm technology node. In this paper, we propose an efficient layout decomposition approach for TPL, with the objective to minimize the number of conflicts and stitches. Based on our analysis of actual benchmarks, we found that the whole layout can be reduced into several(More)
Character projection is a key technology to enhance throughput of e-beam lithography, in which characters need to be selected and placed on the stencil. This paper solves the problem of planning for overlapping-aware row-structure stencil, and also considers multi-column cell system for further throughput improvement. We propose an integrated framework to(More)
E-Beam Lithography (EBL) is a maskless nanolithography technology that creates features on a wafer by directly shooting a beam of electrons onto the wafer. Different from the current mainstream optical lithography technology, <i>i.e</i>. 193nm ArF immersion lithography, EBL overcomes the limit of light diffraction. As one of the most promising next(More)
To explore the effects of insulin-like growth factor-1 (IGF-1) on migration, proliferation and differentiation of mesenchymal stem cells (MSCs). MSCs were obtained from Sprague-Dawley rats by a combination of gradient centrifugation and cell culture techniques and treated with IGF-1 at concentrations of 5–20 ng/ml. Proliferation of MSCs was determined as(More)
Triple Patterning Lithography (TPL) is regarded as a promising technique to handle the manufacturing challenges in 14nm and beyond technology node. It is necessary to consider TPL in early design stages to make the layout more TPL friendly and reduce the manufacturing cost. In this paper, we propose a flow to co-optimize cell layout decomposition and(More)
Block Copolymer Directed Self-Assembly (DSA) is a promising technique to print contacts/vias for the 10nm technology node and beyond. By using hybrid lithography that cooperates DSA with multiple patterning, multiple masks are used to print the DSA templates and then the templates can be used to guide the self-assembly of the block copolymer. In this paper,(More)
To reduce chip-scale topography variation, dummy fill is commonly used to improve the layout density uniformity. Previous work either sought the most uniform density distribution or sought to minimize the inserted dummy fills while satisfying certain density uniformity constraint. However, due to more stringent manufacturing challenges, more criteria, like(More)
As the minimum feature size continues to shrink, whereas the wavelength of light used for lithography remains constant, Resolution Enhancement Techniques are widely used to optimize mask, so as to improve the subwavelength printability. Besides correcting for error between the printed image and target shape, a mask optimization method also needs to consider(More)