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Dynamic B-mode ultrasound imaging of vocal fold vibration during phonation.
TLDR
This is the first time that vocal fold vibration physiology has been studied using B-mode imaging and Echo-PIV, and showed a quasi-longitudinal wave along the body of the vocal folds in the coronal plane. Expand
THE EFFECT OF LEADING EDGE PROTUBERANCES ON THE PERFORMANCE OF SMALL ASPECT RATIO FOILS
Inspired by humpback whale's flippers (1, 2), this study investigated the effect of aspect ratio and shape of protuberances on the performance of airfoil with protuberances on leading edge. NACA0012Expand
Towards an intermediate water wave model of vocal fold vibration : Evidence from vocal-fold dynamic sonography
A simplified water wave model was developed for predicting the global vibration of human vocal folds. As the depth of the liquids in the lamina propria is 1/2–1/20 of the wavelength, they wereExpand
Turbulence Generation in Homogeneous Particle-Laden Flows
The generation of turbulence by uniform e uxes of monodisperse spherical particles moving through a uniform e owing gas was studied experimentally. Phase velocities, moments, probability densityExpand
Basic design of a series propeller with vibration consideration by genetic algorithm
Genetic algorithms (GAs) can powerfully search for parameters in a large multidimensional design space. Thus, the principle can be applied to preliminary series propeller design problems withExpand
Two threshold resist models for optical proximity correction
TLDR
Two constant threshold resist models were determined by model fitting process based on different types of pattern structures and good corrections on both of the one-dimensional line/space widths and two-dimensionalline-ends could be achieved. Expand
90-nm lithography process characterization using ODP scatterometry technology
CD-SEM and scatterometry are two of the top candidates for CD metrology in 90 nm node. In this study, Optical Digital Profilometry (ODP) based scatterometry was used to evaluate four topics: CD SEMExpand
Phenomena and OPC solution of ripple patterns for 65-nm node
TLDR
An advanced OPC approach by the segmentation analysis on polygons as well as the correction algorithm optimization has been developed and applied to solve the ripples on patterning for the 65nm node problem. Expand
Low-k1 optical lithography for 100 nm logic technology and beyond
In this article, we present 193 nm lithography at a k1 factor of 0.37–0.40 and discuss several topics important to 100 nm logic such as optical proximity correction (OPC), control of criticalExpand
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