Jason M. Blackburn

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Device-quality copper and nickel films were deposited onto planar and etched silicon substrates by the reduction of soluble organometallic compounds with hydrogen in a supercritical carbon dioxide solution. Exceptional step coverage on complex surfaces and complete filling of high-aspect-ratio features of less than 100 nanometers width were achieved. Nickel(More)
Cu films were deposited onto planar and etched silicon substrates by the hydrogen-assisted reduction of a series of copper(I)(1,1,1,5,5,5-hexafluoro-2,4-acetylacetonate)L compounds [Cu(I)(hfac)L] where L is (2butyne), (1,5-cyclooctadiene), (vinyltrimethylsilane) or (2-methyl-1-hexene-3-yne) in supercritical solvents using a cold wall, high pressure reactor.(More)
Chemical fluid deposition (CFD) is a novel approach to metal deposition that involves the chemical reduction of organometallic compounds in supercritical carbon dioxide to yield high purity films at low temperature. Since supercritical CO2 can exhibit densities that approach those of a liquid solvent while retaining the transport properties of a gas, CFD is(More)
, 141 (2001); 294 Science et al. Jason M. Blackburn Carbon Dioxide Deposition of Conformal Copper and Nickel Films from Supercritical This copy is for your personal, non-commercial use only. clicking here. colleagues, clients, or customers by , you can order high-quality copies for your If you wish to distribute this article to others here. following the(More)
Chemical vapor deposition (CVD) is an established, versatile technique for the preparation of high-quality metal and semiconductor thin films on solid surfaces.1,2 Despite its utility, constraints inherent to the process, including the requirement of high precursor vapor pressure and thermally coupled transport and deposition steps, generally preclude its(More)
High-purity palladium films were deposited onto Si wafers and polyimide by the reduction of organopalladium compounds in supercritical CO2 solution using a batch process at temperatures between 40 and 80 °C and pressures between 100 and 140 bar. Hydrogenolysis of π-2-methylallyl(cyclopentadienyl)palladium(II) in CO2 at 60 °C is complete in less than 2 min,(More)
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