James B. Mattzela

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Metal nanowires containing in-wire monolayer junctions of 16-mercaptohexanoic acid were made by replication of the pores of 70 nm diameter polycarbonate track etch membranes. Au was electrochemically deposited halfway through the 6 microm long pores and a self-assembled monolayer (SAM) of 16-mercaptohexadecanoic acid was adsorbed on top. A thin layer of Au(More)
As semiconductor devices become smaller and more complex, eliminating device-degrading contamination (i.e. metal ions, particulate, etc.) becomes more significant. At the same time, material removal (etch) has become increasingly important and has led to the introduction of more aggressive chemicals for both creation of the needed geometries and the need to(More)
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