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  • Gerald Lucovsky, Gilbert B. Rayner, Daiwen Kang, Christopher L Hinkle, J. G. Hong
  • Chemistry
  • 2004 (First Published: 1 September 2004)
  • Abstract Chemical phase separation at device processing temperatures is an important issue for integration of Zr and Hf silicates alloys into advanced CMOS devices. Chemical phase separation into ZrOContinue Reading