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- Ibrahim M. Elfadel, David D. Ling
- 1997 Proceedings of IEEE International Conference…
- 1997

Recent work in the area of model-order reduction for RLC interconnect networks has been focused on building reduced-order models that preserve the circuit-theoretic properties of the network, such as stability, passivity, and synthesizability. Passivity is the one circuit-theoretic property that is vital for the successful simulation of a large circuit… (More)

- Ibrahim M. Elfadel, Rosalind W. Picard
- IEEE Trans. Pattern Anal. Mach. Intell.
- 1994

Gibbs random eld (GRF) models and co-occurrence statistics are typically considered as separate but useful tools for texture discrimination. In this paper we show an explicit relationship between co-occurrences and a large class of GRF's. This result comes from a new framework based on a set-theoretic concept called the \aura set" and on measures of this… (More)

- Andrew R. Conn, Ibrahim M. Elfadel, +4 authors C. B. Whan
- DAC
- 1999

This paper describes a method of optimally sizing digital circuits on a static-timing basis. All paths through the logic are considered simultaneously and no input patterns need be specified by the user. The method is unique in that it is based on gradient-based, nonlinear optimization and can accommodate transistor-level schematics without the need for… (More)

- Rosalind W. Picard, Ibrahim M. Elfadel
- Journal of Mathematical Imaging and Vision
- 1992

The aura matrix of an image indicates how much of each gray level is present in the neighborhood of each other gray level and generalizes the popular texture-analysis tool, the co-occurrence matrix. In this paper we show that interesting structure appears in both the aura and co-occurrence matrices for textures that are synthesized from Gibbs random-field… (More)

- Luís Miguel Silveira, Mattan Kamon, Ibrahim M. Elfadel, Jacob K. White
- Proceedings of International Conference on…
- 1996

Since the first papers on asymptotic waveform evaluation (AWE), Pade-based reduced order models have become standard for improving coupled circuit-interconnect simulation efficiency. Such models can be accurately computed using bi-orthogonalization algorithms like Pade via Lanczos (PVL), but the resulting Pade approximates can still be unstable even when… (More)

Since the rst papers on asymptotic waveform evaluation (AWE), Pad e-based reduced order models have become standard for improving coupled circuit-interconnect simulation eeciency. Such models can be accurately computed using bi-orthogonalization algorithms like Pad e via Lanczos (PVL), but the resulting Pad e approximates can still be unstable even when… (More)

We use a new \aura" framework to rewrite the non-linear energy function of a homogeneous anisotropic Markov/Gibbs random eld (MRF) as a linear sum of aura measures. The new formulation relates MRF's to co-occurrence matrices. It also provides a physical interpretation of MRF textures in terms of the mixing and separation of graylevel sets, and in terms of… (More)

- Zheng Zhang, Tarek A. El-Moselhy, Ibrahim M. Elfadel, Luca Daniel
- IEEE Transactions on Computer-Aided Design of…
- 2013

Uncertainties have become a major concern in integrated circuit design. In order to avoid the huge number of repeated simulations in conventional Monte Carlo flows, this paper presents an intrusive spectral simulator for statistical circuit analysis. Our simulator employs the recently developed generalized polynomial chaos expansion to perform uncertainty… (More)

- Ibrahim M. Elfadel, John L. Wyatt
- NIPS
- 1993

We use mean-field theory methods from Statistical Mechanics to derive the "softmax" nonlinearity from the discontinuous winnertake-all (WTA) mapping. We give two simple ways of implementing "soft max" as a multiterminal network element. One of these has a number of important network-theoretic properties. It is a reciprocal, passive, incrementally passive,… (More)

- Tarek A. El-Moselhy, Ibrahim M. Elfadel, Luca Daniel
- ICCAD
- 2008

Lithographic limitations and manufacturing uncertainties are resulting in fabricated shapes on wafer that are topologically equivalent, but geometrically different from the corresponding drawn shapes. While first-order sensitivity information can measure the change in pattern parasitics when the shape variations are small, there is still a need for a… (More)