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PC-l 3-2 Conbination of Chenical Mechanical Polishing and Ultrahigh Vacuum Chemical Yapor Deposition Techniques to Fabricate Polycrystalline Thin Film Transistors
Top-gate polycrystatline silicon (poly-Si) thin film tr"nsistors CIFTS) have been fabricated by ultraligh vacuum chemical deposition (UI{V/CVD) and chemical mechanical polishing (CXr4P) techniques.Expand
Optimizing GaN / A 1 GaN Multiple Quantum Well Structures by TimeResolved Photoluminescence
We present the results of picosecond time-resolved photoluminescence (PL) measurements for GaN/A1Ga1N MQWs with varying structural parameters, grown by metalorganic chemical vapor deposition underExpand