Huatan Qiu

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Darren A. Alman Huatan Qiu T. Spila Keith C. Thompson Erik L. Antonsen Brian E. Jurczyk D. N. Ruzic University of Illinois at Urbana-Champaign Urbana, Illinois 61801 E-mail: dalman@starfireindustries.com Abstract. Extreme ultraviolet EUV light sources with efficient emission at 13.5 nm are needed for next-generation lithography. A critical consideration in(More)
D. N. Ruzic University of Illinois at Urbana-Champaign Department of Nuclear, Plasma and Radiological Engineering 103 S Goodwin Ave. 214 NEL Urbana, Illinois 61801 Abstract. A critical issue for EUV lithography EUVL is the minimization of collector degradation from intense plasma erosion, debris deposition, and hydrocarbon/oxide contamination. Collector(More)
The University of Illinois at Urbana-Champaign (UIUC) and several national laboratories are collaborating on an SEMATECH effort to characterize xenon plasma exposure effects on EUV condenser optics. A series of mirror samples provided by SEMATECH were exposed for 10M shots in an Xtreme Technologies XTS 13-35 commercial EUV discharge plasma source at UIUC(More)
Tim P. Spila University of Illinois at Urbana-Champaign Center for Microanalysis of Materials Urbana, Illinois 61801 Abstract. The University of Illinois at Urbana-Champaign UIUC and several national laboratories are collaborating on an effort to characterize Xe plasma source exposure effects on extreme ultraviolet EUV collector optics. A series of mirror(More)
Robert L. Bristol Intel Corporation Components Research RA3-252 5200 NE Elam Young Parkway Hillsboro, Oregon 97123 Abstract. One of the critical issues within extreme ultraviolet lithography is mirror lifetime and the degradation due to debris from the pinch. This research investigated and showed the efficacy of using a helium secondary plasma and heat for(More)
Successful implementation of extreme ultraviolet (EUV) lithography depends on research and progress toward minimizing collector optics degradation from intense plasma erosion and debris deposition. Thus studying the surface degradation process and implementing innovative methods, which could enhance the surface chemistry causing the mirrors to suffer less(More)
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