Hua-Yu Chang

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Due to excessive current densities, electromigration may trigger a permanent open- or short-circuit failure in signal wires or power networks in analog or mixed-signal circuits. As the feature size keeps shrinking, this effect becomes a key reliability concern. Hence, in this paper, we focus on wiring topology generation for avoiding electromigration at the(More)
Metal-only ECO realizes the last-minute design changes by revising the photomasks of metal layers only. This task is challenging because the pre-injected spare cells are limited both in number and in cell types. This paper proposes a matching-based ECO synthesizer, named ECOS, that correctly implements the incremental design changes using the available(More)
—Due to the rapidly increasing design complexity in modern integrated circuit design, more and more timing failures are detected at late stages. Without deferring time-to-market, metal-only engineering change order (ECO) is an economical technique to correct these late-found failures. Typically, a design might need to undergo many ECO runs in design houses;(More)
—To ease the time-to-market pressure and save the photomask cost, metal-only ECO realizes the last-minute design changes by revising the photomasks of metal layers only. This task is challenging because the pre-injected spare cells are limited in number and in cell types. Metal-only ECO has to implement these functional and/or timing changes using available(More)
Due to the rapidly increasing design complexity in modern IC designs, metal-only engineering change order (ECO) becomes inevitable to achieve design closure with a low respin cost. Traditionally, preplaced redundant standard cells are regarded as spare cells. However, these cells are limited by predefined functionalities and locations, and they always(More)
Multiple patterning lithography has been recognized as one of the most promising solutions, in addition to extreme ultraviolet lithography, directed self-assembly, nanoimprint lithography, and electron beam lithography, for advancing the resolution limit of conventional optical lithography. Multiple patterning layout decomposition (MPLD) becomes more(More)