Hirofumi Takikawa

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—We prepared AlN film on c-plane sapphire substrate by electron cyclotron resonance plasma-enhanced sputtering deposition (ECR-sputtering). X-ray diffraction (XRD) verified the epitaxial growth of AlN films with the full width at half maximum (FWHM) of rocking curve of 0.04 deg. even on the film thickness of 100 nm. XRD also verified slight change of peak(More)
Carbon nanocoil (CNC), which is synthesized by a catalytic chemical vapor deposition (CCVD) method, has a coil diameter of 300–900 nm and a length of several tens of μm. Although it is very small, CNC is predicted to have a high mechanical strength and hence is expected to have a use in nanodevices such as electromagnetic wave absorbers and field emitters.(More)
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