Hidehiko Okuda

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CMOS image sensor has been widely used for ubiquitous devices. However, CMOS image sensor devices performance is dramatically influenced by process induced defects such as metallic impurities contamination at devices active region during CMOS devices process. Thus, it is extremely important to study metallic impurities influence on CMOS image sensor devices(More)
We describe the effect of microwave heating on C<inf>3</inf>H<inf>5</inf> carbon cluster ion implanted epitaxial wafers using a high dose amount of carbon cluster ion implantation condition. A high dose amount condition of C<inf>3</inf>H<inf>5</inf> carbon cluster ion implantation generates implantation-related defects, such as stacking faults, after(More)
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