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A new tomographic reconstruction scheme is proposed that uses a genetic algorithm (GA), a robust and com-binatorial function optimization based on the mechanics of the genetic principle. The paper first discusses the implicitly parallel and scaled random nature of the GA optimization using an illustrative example. An introduction of the elementary(More)
The bulk piezoresistivity of carbon nanotube (CNT) in polymer matrix was discussed to develop a strain sensor for engineering applications. The polymer improves interfacial bonding between the nanotubes and the CNT composite and that enhances the strain transfer, repeatability, and linearity of the sensor. The largest contribution of piezoresistivity of the(More)
Electrohydrodynamic (EHD) spraying has been utilized in applications varying from micro-colloid thrusters to technology for film deposition and inkjet printing. Recently, EHD inkjet heads were developed to facilitate the fabrication of printed electronics such as digital displays, printed circuit boards (PCBs), and solar cells. Here, we report the(More)
For an electrohydrodynamic (EHD) jet, variables such as the direction of the meniscus and the ejection stability need to be analyzed. Thus, the EHD jet should be observed three-dimensionally (3D) because the variables can only be obtained in the 3D field, especially in unstable modes. However, if the 3D field is reconstructed from multi-directional binary(More)
In this Letter, a three-dimensional (3D) optical correction method, which was verified by simulation, was developed to reconstruct droplet-based flow fields. In the simulation, a synthetic phantom was reconstructed using a simultaneous multiplicative algebraic reconstruction technique with three detectors positioned at the synthetic object (represented by(More)
Three-dimensional optical tomography techniques were developed to reconstruct three-dimensional objects using a set of two-dimensional projection images. Five basis functions, such as cubic B-spline, o-Moms, keys, and cosine functions and Gaussian basis functions, were used to calculate the weighting coefficients for a projection matrix. Two different forms(More)
Recently, as DRAM device scale is decreasing, multi-patterning and ACL(Amorphous Carbon Layer) process steps are increasing for DRAM manufacturing[1]. This change needs to improve film thickness uniformity to hold a CD(Critical Dimension) uniformity. A showerhead structure is widely adopted in a RF(Radio Frequency) plasma reactor for the thin film(More)
Increasing data needs much larger memory capacity. One of the Flash Memory Solution is Vertical NAND (V-NAND) Flash Memory. In order to fabricate this device, a high aspect ratio hole must be made in the channel hole through the etching process after multilayer thin film deposition. In order to obtain high aspect ratio etch, process condition should have(More)