Hai-Lin Cong

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Stable, ultrathin DNA micropatterns were fabricated from photosensitive polymer diazoresin (DR) through a self-assembly technique. The micropatterns were achieved on LBL ultrathin film after UV exposure through a photomask. The patterns were characterized systematically with scanning electron microscopy, atomic force microscopy, X-ray photoelectron(More)
In this paper, a thorough investigation on a memory yield detractor due to metal void is presented. The metal void was found to have a strong dependency on isolated well size. It was formed due to galvanic effect. The failure mechanism in this unique case was found due to a potential developed from charges on the wafer surface and opposing charges trapped(More)
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